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UV Fused Silica Positive Meniscus Lenses, UV AR-Coated


  • UV AR Coating Deposited on UV-Grade Fused Silica Substrate
  • Use with Other Lenses to Increase the NA of an Optical System
  • Frequently used to Reduce Beam Distortion

LE4412-UV

(Ø2")

LE4197-UV

(Ø1")

LE4173-UV

(Ø1")

Related Items


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Type UV Coated*
Lens Shape Positive Meniscus
Diameters Available 1" or 2"
Diameter Tolerance +0.00 mm / -0.10 mm
Substrate Material UV Grade Fused Silica
AR Coating Range 245 -400 nm
Damage Threshold 5 J/cm2 (355 nm, 10 ns, 10 Hz, Ø0.350 mm)
Reflectivity Over Coating Range
(AOI = 0°)
Ravg <0.5%
Transmission TInternal ≥ 88%/cm @ 185 nm
Focal Length Tolerance ±1%
Surface Quality 40-20 Scratch-Dig
Design Wavelength 588 nm (n=1.460)
Index of Refraction (@ Design λ) 1.460
Centration ≤3 arcmin

*These lenses are also available uncoated.

Optic Cleaning Tutorial Optical Coatings and Substrates
Zemax Files
Click on the red Document icon next to the item numbers below to access the Zemax file download. Our entire Zemax Catalog is also available.

Features

  • Choose from Ø1" or Ø2" Versions
  • UV AR Coating for the 245 - 400 nm Range
  • Focal Lengths Available from 100.0 - 1000.0 mm
  • Fabricated from UV Grade Fused Silica
  • Spherical Surface Power: 3 Fringes
  • Spherical Surface Irregularity: λ/4

Thorlabs' UV Grade Fused Silica Positive Meniscus Lenses are available either uncoated or with a UV antireflection coating for the 245 - 400 nm range deposited on both surfaces. Compared to N-BK7, UV-grade fused silica offers high transmission deeper into the UV (down to 185 nm), better homogeneity, and a lower coefficient of thermal expansion. In addition, UV-grade fused silica exhibits virtually no laser-induced fluorescence (as measured at 193 nm), making it an ideal choice for applications from the UV to the near IR.

The additional UV antireflection coating on these positive meniscus lenses is particularly desirable for applications with multiple optical elements. Since approximately 4% of the incident light is reflected at each surface of an uncoated substrate, the application of a UV AR coating improves transmission, which is particularly important in low-light applications, and prevents the undesirable effects (e.g., ghost images) associated with multiple reflections.

Positive meniscus (convex-concave) lenses, which are thicker in the middle than at the edges and cause light rays to converge, are designed to minimize third-order spherical aberration. When used to focus a collimated beam, as shown in the diagram above, the convex side of the lens should face the source to minimze spherical aberration. They are often used in conjunction with other lenses to decrease the focal length, and therefore increase the numerical aperture (NA), of an optical assembly. Since a positive meniscus lens has a greater radius of curvature on the concave side of the lens than on the convex side, real images can be formed.

Thorlabs offers their negative meniscus lenses in Ø1 and Ø2" versions. Each size is compatible with a multitude of Thorlabs lens mounts. Please see the Mounting Options tab for details.

Quick Links to Other Spherical Singlets
Plano-Convex Bi-Convex Best Form Plano-Concave Bi-Concave Positive Meniscus Negative Meniscus
UVFS Transmission
Click to Enlarge

Click Here for Raw Data
Above is the transmission curve for a 10 mm thick uncoated sample of UV fused silica when the incident ilght is normal to the surface. Please note that this is the measured transmission, including surface reflections.
UV AR Coating
Click to Enlarge

Click Here for Raw Data
Above is the reflectivity curve for the UV AR coating deposited on the UV fused silica substrate when the incident light is normal to the surface. The blue shaded region indicates the specified 245 - 400 nm wavelength range for optimum performance.

Thorlabs' Standard Broadband Antireflection Coatings

Using Positive Meniscus Lenses

  • Achieve Tighter Focusing by Combining a Meniscus Lens with Plano-Convex Lenses
  • Build Multi-Element Lens Systems to Achieve Higher NA without Significant Increases in Aberrations

Positive meniscus lenses are designed to minimize spherical aberration. They have one convex and one concave surface. When used in combination with another lens, a positive meniscus lens will shorten the focal length and increase the NA of the system. Figure 1c shows a meniscus lens being used to shorten the focal length of a 100 mm focal length plano-convex lens. In addition, the transverse and lateral aberrations are greatly reduced. The convex surface of both lenses should be facing away from the image.

Figure 1. These figures illustrate the performance gains that can be achieved by using multi-element imaging systems. The combination of a meniscus lens and a plano-convex lens yields a 21 µm focused spot versus a 240 µm spot from the single plano-convex lens.

Damage Threshold Specifications
Coating Designation
(Item # Suffix)
Damage Threshold
-UV 5 J/cm2 (355 nm, 10 ns, 10 Hz, Ø0.350 mm)

Damage Threshold Data for Thorlabs' UV-Coated, UV Fused Silica Lenses

The specifications to the right are measured data for Thorlabs' UV-coated, UV fused silica lenses. Damage threshold specifications are constant for all UV-coated, UV fused silica lenses, regardless of the size or the focal length of the lens.

 

Laser Induced Damage Threshold Tutorial

The following is a general overview of how laser induced damage thresholds are measured and how the values may be utilized in determining the appropriateness of an optic for a given application. When choosing optics, it is important to understand the Laser Induced Damage Threshold (LIDT) of the optics being used. The LIDT for an optic greatly depends on the type of laser you are using. Continuous wave (CW) lasers typically cause damage from thermal effects (absorption either in the coating or in the substrate). Pulsed lasers, on the other hand, often strip electrons from the lattice structure of an optic before causing thermal damage. Note that the guideline presented here assumes room temperature operation and optics in new condition (i.e., within scratch-dig spec, surface free of contamination, etc.). Because dust or other particles on the surface of an optic can cause damage at lower thresholds, we recommend keeping surfaces clean and free of debris. For more information on cleaning optics, please see our Optics Cleaning tutorial.

Testing Method

Thorlabs' LIDT testing is done in compliance with ISO/DIS 11254 and ISO 21254 specifications.

First, a low-power/energy beam is directed to the optic under test. The optic is exposed in 10 locations to this laser beam for 30 seconds (CW) or for a number of pulses (pulse repetition frequency specified). After exposure, the optic is examined by a microscope (~100X magnification) for any visible damage. The number of locations that are damaged at a particular power/energy level is recorded. Next, the power/energy is either increased or decreased and the optic is exposed at 10 new locations. This process is repeated until damage is observed. The damage threshold is then assigned to be the highest power/energy that the optic can withstand without causing damage. A histogram such as that below represents the testing of one BB1-E02 mirror.

LIDT metallic mirror
The photograph above is a protected aluminum-coated mirror after LIDT testing. In this particular test, it handled 0.43 J/cm2 (1064 nm, 10 ns pulse, 10 Hz, Ø1.000 mm) before damage.
LIDT BB1-E02
Example Test Data
Fluence # of Tested Locations Locations with Damage Locations Without Damage
1.50 J/cm2 10 0 10
1.75 J/cm2 10 0 10
2.00 J/cm2 10 0 10
2.25 J/cm2 10 1 9
3.00 J/cm2 10 1 9
5.00 J/cm2 10 9 1

According to the test, the damage threshold of the mirror was 2.00 J/cm2 (532 nm, 10 ns pulse, 10 Hz, Ø0.803 mm). Please keep in mind that these tests are performed on clean optics, as dirt and contamination can significantly lower the damage threshold of a component. While the test results are only representative of one coating run, Thorlabs specifies damage threshold values that account for coating variances.

Continuous Wave and Long-Pulse Lasers

When an optic is damaged by a continuous wave (CW) laser, it is usually due to the melting of the surface as a result of absorbing the laser's energy or damage to the optical coating (antireflection) [1]. Pulsed lasers with pulse lengths longer than 1 µs can be treated as CW lasers for LIDT discussions.

When pulse lengths are between 1 ns and 1 µs, laser-induced damage can occur either because of absorption or a dielectric breakdown (therefore, a user must check both CW and pulsed LIDT). Absorption is either due to an intrinsic property of the optic or due to surface irregularities; thus LIDT values are only valid for optics meeting or exceeding the surface quality specifications given by a manufacturer. While many optics can handle high power CW lasers, cemented (e.g., achromatic doublets) or highly absorptive (e.g., ND filters) optics tend to have lower CW damage thresholds. These lower thresholds are due to absorption or scattering in the cement or metal coating.

Linear Power Density Scaling

LIDT in linear power density vs. pulse length and spot size. For long pulses to CW, linear power density becomes a constant with spot size. This graph was obtained from [1].

Intensity Distribution

Pulsed lasers with high pulse repetition frequencies (PRF) may behave similarly to CW beams. Unfortunately, this is highly dependent on factors such as absorption and thermal diffusivity, so there is no reliable method for determining when a high PRF laser will damage an optic due to thermal effects. For beams with a high PRF both the average and peak powers must be compared to the equivalent CW power. Additionally, for highly transparent materials, there is little to no drop in the LIDT with increasing PRF.

In order to use the specified CW damage threshold of an optic, it is necessary to know the following:

  1. Wavelength of your laser
  2. Beam diameter of your beam (1/e2)
  3. Approximate intensity profile of your beam (e.g., Gaussian)
  4. Linear power density of your beam (total power divided by 1/e2 beam diameter)

Thorlabs expresses LIDT for CW lasers as a linear power density measured in W/cm. In this regime, the LIDT given as a linear power density can be applied to any beam diameter; one does not need to compute an adjusted LIDT to adjust for changes in spot size, as demonstrated by the graph to the right. Average linear power density can be calculated using the equation below. 

The calculation above assumes a uniform beam intensity profile. You must now consider hotspots in the beam or other non-uniform intensity profiles and roughly calculate a maximum power density. For reference, a Gaussian beam typically has a maximum power density that is twice that of the uniform beam (see lower right).

Now compare the maximum power density to that which is specified as the LIDT for the optic. If the optic was tested at a wavelength other than your operating wavelength, the damage threshold must be scaled appropriately. A good rule of thumb is that the damage threshold has a linear relationship with wavelength such that as you move to shorter wavelengths, the damage threshold decreases (i.e., a LIDT of 10 W/cm at 1310 nm scales to 5 W/cm at 655 nm):

CW Wavelength Scaling

While this rule of thumb provides a general trend, it is not a quantitative analysis of LIDT vs wavelength. In CW applications, for instance, damage scales more strongly with absorption in the coating and substrate, which does not necessarily scale well with wavelength. While the above procedure provides a good rule of thumb for LIDT values, please contact Tech Support if your wavelength is different from the specified LIDT wavelength. If your power density is less than the adjusted LIDT of the optic, then the optic should work for your application. 

Please note that we have a buffer built in between the specified damage thresholds online and the tests which we have done, which accommodates variation between batches. Upon request, we can provide individual test information and a testing certificate. The damage analysis will be carried out on a similar optic (customer's optic will not be damaged). Testing may result in additional costs or lead times. Contact Tech Support for more information.

Pulsed Lasers

As previously stated, pulsed lasers typically induce a different type of damage to the optic than CW lasers. Pulsed lasers often do not heat the optic enough to damage it; instead, pulsed lasers produce strong electric fields capable of inducing dielectric breakdown in the material. Unfortunately, it can be very difficult to compare the LIDT specification of an optic to your laser. There are multiple regimes in which a pulsed laser can damage an optic and this is based on the laser's pulse length. The highlighted columns in the table below outline the relevant pulse lengths for our specified LIDT values.

Pulses shorter than 10-9 s cannot be compared to our specified LIDT values with much reliability. In this ultra-short-pulse regime various mechanics, such as multiphoton-avalanche ionization, take over as the predominate damage mechanism [2]. In contrast, pulses between 10-7 s and 10-4 s may cause damage to an optic either because of dielectric breakdown or thermal effects. This means that both CW and pulsed damage thresholds must be compared to the laser beam to determine whether the optic is suitable for your application.

Pulse Duration t < 10-9 s 10-9 < t < 10-7 s 10-7 < t < 10-4 s t > 10-4 s
Damage Mechanism Avalanche Ionization Dielectric Breakdown Dielectric Breakdown or Thermal Thermal
Relevant Damage Specification No Comparison (See Above) Pulsed Pulsed and CW CW

When comparing an LIDT specified for a pulsed laser to your laser, it is essential to know the following:

Energy Density Scaling

LIDT in energy density vs. pulse length and spot size. For short pulses, energy density becomes a constant with spot size. This graph was obtained from [1].

  1. Wavelength of your laser
  2. Energy density of your beam (total energy divided by 1/e2 area)
  3. Pulse length of your laser
  4. Pulse repetition frequency (prf) of your laser
  5. Beam diameter of your laser (1/e2 )
  6. Approximate intensity profile of your beam (e.g., Gaussian)

The energy density of your beam should be calculated in terms of J/cm2. The graph to the right shows why expressing the LIDT as an energy density provides the best metric for short pulse sources. In this regime, the LIDT given as an energy density can be applied to any beam diameter; one does not need to compute an adjusted LIDT to adjust for changes in spot size. This calculation assumes a uniform beam intensity profile. You must now adjust this energy density to account for hotspots or other nonuniform intensity profiles and roughly calculate a maximum energy density. For reference a Gaussian beam typically has a maximum energy density that is twice that of the 1/e2 beam.

Now compare the maximum energy density to that which is specified as the LIDT for the optic. If the optic was tested at a wavelength other than your operating wavelength, the damage threshold must be scaled appropriately [3]. A good rule of thumb is that the damage threshold has an inverse square root relationship with wavelength such that as you move to shorter wavelengths, the damage threshold decreases (i.e., a LIDT of 1 J/cm2 at 1064 nm scales to 0.7 J/cm2 at 532 nm):

Pulse Wavelength Scaling

You now have a wavelength-adjusted energy density, which you will use in the following step.

Beam diameter is also important to know when comparing damage thresholds. While the LIDT, when expressed in units of J/cm², scales independently of spot size; large beam sizes are more likely to illuminate a larger number of defects which can lead to greater variances in the LIDT [4]. For data presented here, a <1 mm beam size was used to measure the LIDT. For beams sizes greater than 5 mm, the LIDT (J/cm2) will not scale independently of beam diameter due to the larger size beam exposing more defects.

The pulse length must now be compensated for. The longer the pulse duration, the more energy the optic can handle. For pulse widths between 1 - 100 ns, an approximation is as follows:

Pulse Length Scaling

Use this formula to calculate the Adjusted LIDT for an optic based on your pulse length. If your maximum energy density is less than this adjusted LIDT maximum energy density, then the optic should be suitable for your application. Keep in mind that this calculation is only used for pulses between 10-9 s and 10-7 s. For pulses between 10-7 s and 10-4 s, the CW LIDT must also be checked before deeming the optic appropriate for your application.

Please note that we have a buffer built in between the specified damage thresholds online and the tests which we have done, which accommodates variation between batches. Upon request, we can provide individual test information and a testing certificate. Contact Tech Support for more information.


[1] R. M. Wood, Optics and Laser Tech. 29, 517 (1998).
[2] Roger M. Wood, Laser-Induced Damage of Optical Materials (Institute of Physics Publishing, Philadelphia, PA, 2003).
[3] C. W. Carr et al., Phys. Rev. Lett. 91, 127402 (2003).
[4] N. Bloembergen, Appl. Opt. 12, 661 (1973).

CXY1 in 30 mm Cage System
Click to Enlarge

CXY1 Translation Mount and
SM1 Lens Tube Mounted in a
30 mm Cage System
Threaded Mounting Adapter
Click to Enlarge

Ø1" Optic Mounted in a
ST1XY-S XY Translator

Click to Enlarge

LMR1 Fixed Mount with Ø1" Lens

Click to Enlarge

LM2XY Translating Mount with Ø2" Lens
Recommended Mounting Options for Thorlabs Lenses
Item # Mounts for Ø5 mm to Ø10 mm Optics
Imperial Metric
(Various) Fixed Lens Mounts for Small Optics, Ø5 mm to Ø10 mm
(Various) Small Optic Adapters for Use with Standard Fixed Lens Mounts, Ø5 mm to Ø10 mm
Item # Mounts for Ø1/2" (Ø12.7 mm) Optics
Imperial Metric
LMR05 LMR05/M Fixed Lens Mount for Ø1/2" Optics
LM05XY LM05XY/M Translating Lens Mount for Ø1/2" Optics
SCP05 16 mm Cage System, XY Translation Mount for Ø1/2" Optics
(Various) Ø1/2" Lens Tubes,
Optional SM05RRC Retaining Ring for High-Curvature Lenses (See Below)
Item # Mounts for Ø1" (Ø25.4 mm) Optics
Imperial Metric
LMR1 LMR1/M Fixed Lens Mount for Ø1" Optics
LM1XY LM1XY/M Translating Lens Mount for Ø1" Optics
ST1XY-S ST1XY-S/M Translating Lens Mount with Micrometer Drives (Other Drives Available)
CXY1 30 mm Cage System, XY Translation Mount for Ø1" Optics
(Various) Ø1" Lens Tubes,
Optional SM1RRC Retaining Ring for High-Curvature Lenses (See Below)
Item # Mounts for Ø2" (Ø50.8 mm) Optics
Imperial Metric
LMR2 LMR2/M Fixed Lens Mount for Ø2" Optics
LM2XY LM2XY/M Translating Lens Mount for Ø2" Optics
CXY2 60 mm Cage System, XY Translation Mount for Ø2" Optics
(Various) Ø2" Lens Tubes,
Optional SM2RRC Retaining Ring for High-Curvature Lenses (See Below)
Item # Adjustable Optic Mounts
Imperial Metric
LH1 LH1/M Adjustable Mount for Ø0.28" (Ø7.1 mm) to Ø1.80" (Ø45.7 mm) Optics
LH2 LH2/M Adjustable Mount for Ø0.77" (Ø19.6 mm) to Ø2.28" (Ø57.9 mm) Optics
VG100 VG100/M Adjustable Clamp for Ø0.5" (Ø13 mm) to Ø3.5" (Ø89 mm) Optics
SCL03 SCL03/M Self-Centering Mount for Ø0.15" (Ø3.8 mm) to Ø1.77" (Ø45.0 mm) Optics
SCL04 SCL04/M Self-Centering Mount for Ø0.15" (Ø3.8 mm) to Ø3.00" (Ø76.2 mm) Optics
LH160C LH160C/M Adjustable Mount for 60 mm Cage Systems,
Ø0.50" (Ø13 mm) to Ø2.00" (Ø50.8 mm) Optics
SCL60C SCL60C/M Self-Centering Mount for 60 mm Cage Systems,
Ø0.15" (Ø3.8 mm) to Ø1.77" (Ø45.0 mm) Optics

 

Mounting High-Curvature Optics

Thorlabs' retaining rings are used to secure unmounted optics within lens tubes or optic mounts. These rings are secured in position using a compatible spanner wrench. For flat or low-curvature optics, standard retaining rings manufactured from anodized aluminum are available from Ø5 mm to Ø4". For high-curvature optics, extra-thick retaining rings are available in Ø1/2", Ø1", and Ø2" sizes.

Extra-thick retaining rings offer several features that aid in mounting high-curvature optics such as aspheric lenses, short-focal-length plano-convex lenses, and condenser lenses. As shown in the animation to the right, the guide flange of the spanner wrench will collide with the surface of high-curvature lenses when using a standard retaining ring, potentially scratching the optic. This contact also creates a gap between the spanner wrench and retaining ring, preventing the ring from tightening correctly. Extra-thick retaining rings provide the necessary clearance for the spanner wrench to secure the lens without coming into contact with the optic surface.


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Ø1" (25.4 mm) UV Fused Silica Positive Meniscus Lenses, UV AR-Coated

Item # Diameter Focal
Length
Dioptera Radius of
Curvature 1
Radius of
Curvature 2
Center
Thickness
Edge
Thicknessb
Back Focal
Lengthc
Clear
Aperture
Reference
Drawing
LE4173-UV 1" 100.0 mm +10.0 31.0 mm 91.2 mm 4.0 mm 2.2 mm 95.9 mm >Ø22.86 mm Positive Meniscus Lens Drawing
LE4197-UV 1" 150.0 mm +6.7 47.6 mm 149.8 mm 3.2 mm 2.0 mm 146.8 mm
LE4467-UV 1" 200.0 mm +5.0 64.2 mm 209.8 mm 2.9 mm 2.0 mm 197.2 mm
LE4329-UV 1" 300.0 mm +3.3 97.6 mm 330.6 mm 2.6 mm 2.0 mm 297.5 mm
LE4484-UV 1" 500.0 mm +2.0 166.8 mm 603.4 mm 2.4 mm 2.0 mm 497.8 mm
LE4950-UV 1" 1000.0 mm +1.0 348.0 mm 1425.7 mm 2.2 mm 2.0 mm 998.0 mm

Suggested Fixed Lens Mount: LMR1(/M)

  • Reciprocal of the Focal Length in Meters
  • Edge Thickness Given Before 0.2 mm at 45° Typical Chamfer
  • Measured at the Design Wavelength, 588 nm
Based on your currency / country selection, your order will ship from Newton, New Jersey  
+1 Qty Docs Part Number - Universal Price Available
LE4173-UV Support Documentation
LE4173-UVf = 100.0 mm, Ø1" UV Fused Silica Positive Meniscus Lens, AR Coating: 245-400 nm
$111.36
Today
LE4197-UV Support Documentation
LE4197-UVf = 150.0 mm, Ø1" UV Fused Silica Positive Meniscus Lens, AR Coating: 245-400 nm
$110.31
Today
LE4467-UV Support Documentation
LE4467-UVf = 200.0 mm, Ø1" UV Fused Silica Positive Meniscus Lens, AR Coating: 245-400 nm
$110.31
Today
LE4329-UV Support Documentation
LE4329-UVf = 300.0 mm, Ø1" UV Fused Silica Positive Meniscus Lens, AR Coating: 245-400 nm
$110.31
Today
LE4484-UV Support Documentation
LE4484-UVf = 500.0 mm, Ø1" UV Fused Silica Positive Meniscus Lens, AR Coating: 245-400 nm
$107.16
Today
LE4950-UV Support Documentation
LE4950-UVf = 1000.0 mm, Ø1" UV Fused Silica Positive Meniscus Lens, AR Coating: 245-400 nm
$107.16
Today

Ø2" (50.8 mm) UV Fused Silica Positive Meniscus Lenses, UV AR-Coated

Item # Diameter Focal
Length
Dioptera Radius of
Curvature 1
Radius of
Curvature 2
Center
Thickness
Edge
Thicknessb
Back Focal
Lengthc
Clear
Aperture
Reference
Drawing
LE4412-UV 2" 100.0 mm +10.0 30.6 mm 80.9 mm 10.7 mm 1.2 mm 89.0 mm >Ø45.72 mm Positive Meniscus Lens Drawing
LE4125-UV 2" 150.0 mm +6.7 46.5 mm 135.3 mm 7.8 mm 2.7 mm 142.0 mm
LE4560-UV 2" 200.0 mm +5.0 63.0 mm 193.4 mm 6.6 mm 2.9 mm 193.4 mm
LE4984-UV 2" 300.0 mm +3.3 97.6 mm 327.6 mm 5.4 mm 3.0 mm 294.8 mm
LE4150-UV 2" 500.0 mm +2.0 165.4 mm 582.2 mm 5.0 mm 3.6 mm 495.2 mm
LE4822-UV 2" 1000.0 mm +1.0 356.7 mm 1580.2 mm 5.0 mm 4.3 mm 995.6 mm

Suggested Fixed Lens Mount: LMR2(/M)

  • Reciprocal of the Focal Length in Meters
  • Edge Thickness Given Before 0.2 mm at 45° Typical Chamfer
  • Measured at the Design Wavelength, 588 nm
Based on your currency / country selection, your order will ship from Newton, New Jersey  
+1 Qty Docs Part Number - Universal Price Available
LE4412-UV Support Documentation
LE4412-UVf = 100.0 mm, Ø2" UV Fused Silica Positive Meniscus Lens, AR Coating: 245-400 nm
$382.42
Today
LE4125-UV Support Documentation
LE4125-UVf = 150.0 mm, Ø2" UV Fused Silica Positive Meniscus Lens, AR Coating: 245-400 nm
$345.65
Today
LE4560-UV Support Documentation
LE4560-UVf = 200.0 mm, Ø2" UV Fused Silica Positive Meniscus Lens, AR Coating: 245-400 nm
$333.04
Today
LE4984-UV Support Documentation
LE4984-UVf = 300.0 mm, Ø2" UV Fused Silica Positive Meniscus Lens, AR Coating: 245-400 nm
$320.43
Today
LE4150-UV Support Documentation
LE4150-UVf = 500.0 mm, Ø2" UV Fused Silica Positive Meniscus Lens, AR Coating: 245-400 nm
$320.43
Today
LE4822-UV Support Documentation
LE4822-UVf = 1000.0 mm, Ø2" UV Fused Silica Positive Meniscus Lens, AR Coating: 245-400 nm
$313.08
Today
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